Semiconductor crystal substrate, infrared detector, method for producing semiconductor crystal substrate, and method for producing infrared detector

ABSTRACT

A semiconductor crystal substrate includes a crystal substrate that is formed of a material including one of GaSb and InAs, a first buffer layer that is formed on the crystal substrate and formed of a material including GaSb, and a second buffer layer that is formed on the first buffer layer and formed of a material including GaSb. The first buffer layer has a p-type conductivity, and the second buffer layer has an n-type conductivity.

CROSS-REFERENCE TO RELATED APPLICATION

This application is based upon and claims the benefit of priority ofJapanese Patent Application No. 2016-116470 filed on Jun. 10, 2016, theentire contents of which are incorporated herein by reference.

FIELD

An aspect of this disclosure relates to a semiconductor crystalsubstrate, an infrared detector, a method for producing thesemiconductor crystal substrate, and a method for producing the infrareddetector.

BACKGROUND

There exist infrared detectors comprised of semiconductor materials. Anexample of such an infrared detector has a configuration where aninfrared absorption layer with an InAs/GaSb superlattice structure isformed on a GaSb substrate. The InAs/GaSb superlattice structure formingthe infrared absorption layer is a type-II superlattice (T2SL) structureand has a type-II band lineup. Accordingly, by adjusting the filmthickness and the period of the superlattice of the InAs/GaSbsuperlattice structure, it is possible to obtain an infrared detectorthat is sensitive in a wavelength range from a middle wave (MW) infraredwavelength of 3-5 μm to a long wave (LW) infrared wavelength of 8-10 μm.

A PIN-type infrared detector with a T2SL structure uses interbandoptical absorption. For this reason, it is expected that a PIN-typeinfrared detector with a T2SL structure will have improved temperaturecharacteristics compared with a quantum dot infrared photodetector(QDIP) and a quantum well infrared photodetector (QWIP) that useintersubband optical absorption. Such a PIN-type infrared detector witha T2SL structure is desired to have high light sensitivity and a lowdark current in addition to improved temperature characteristics.

To obtain a PIN-type infrared detector using a T2SL structure and havinghigh light sensitivity and a low dark current, it is necessary to form ahigh-quality T2SL crystal in the infrared absorption layer. Also, toform a high-quality T2SL crystal, it is necessary to form a GaSb bufferlayer with high flatness below the infrared absorption layer (see, forexample, Japanese Laid-Open Patent Publication No. 2015-109388 andJapanese Laid-Open Patent Publication No. 03-129721). For example, “M.Lee et al., Journal of Applied Physics 59, 2895 (1986)” proposesimproving the quality of a GaSb buffer layer by changing the growthtemperature and the V/III ratio in molecular beam epitaxy (MBE).Specifically, “M. Lee et al., Journal of Applied Physics 59, 2895(1986)” discloses that an excellent GaSb layer can be formed byperforming epitaxial growth at a growth temperature between 500° C. and550° C. and with a V/III ratio between 5 and 10.

SUMMARY

According to an aspect of this disclosure, there is provided asemiconductor crystal substrate. The semiconductor crystal substrateincludes a crystal substrate that is formed of a material including oneof GaSb and InAs, a first buffer layer that is formed on the crystalsubstrate and formed of a material including GaSb, and a second bufferlayer that is formed on the first buffer layer and formed of a materialincluding GaSb. The first buffer layer has a p-type conductivity, andthe second buffer layer has an n-type conductivity.

The object and advantages of the invention will be realized and attainedby means of the elements and combinations particularly pointed out inthe claims.

It is to be understood that both the foregoing general description andthe following detailed description are exemplary and explanatory and arenot restrictive of the invention.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a drawing illustrating an exemplary structure of asemiconductor crystal substrate where a GaSb layer is formed on a GaSbsubstrate;

FIG. 2 is a drawing illustrating an AFM image of a surface of a GaSbsubstrate;

FIG. 3 is a drawing illustrating an AFM image of a surface of a GaSblayer formed on a GaSb substrate at a substrate temperature of 520° C.;

FIG. 4 is a drawing illustrating an AFM image of a surface of a GaSblayer formed on a GaSb substrate at a substrate temperature of 440° C.;

FIG. 5 is a drawing illustrating an exemplary structure of asemiconductor crystal substrate according to a first embodiment;

FIG. 6 is a drawing illustrating an AFM image of a surface of a GaSblayer of a semiconductor crystal substrate according to the firstembodiment;

FIG. 7 is a drawing illustrating carrier concentrations in GaSb layersof a semiconductor crystal substrate according to the first embodiment;

FIG. 8 is a drawing illustrating an AFM image of a surface of a secondGaSb layer formed at a temperature of 470° C.;

FIG. 9 is a drawing illustrating an AFM image of a surface of a secondGaSb layer formed at a temperature of 410° C.;

FIGS. 10A through 10C are drawings illustrating a method for producing asemiconductor crystal substrate according to the first embodiment;

FIG. 11 is a drawing illustrating an example of a configuration of aninfrared detector according to a second embodiment;

FIG. 12 is an enlarged view of a part of the infrared detector of FIG.11;

FIG. 13 is a perspective view of the infrared detector of FIG. 11;

FIGS. 14A and 14B are drawings illustrating steps of a method forproducing an infrared detector according to the second embodiment;

FIGS. 15A and 15B are drawings illustrating steps of the method forproducing the infrared detector according to the second embodiment;

FIGS. 16A and 16B are drawings illustrating steps of the method forproducing the infrared detector according to the second embodiment;

FIGS. 17A and 17B are drawings illustrating steps of the method forproducing the infrared detector according to the second embodiment;

FIG. 18 is a drawing illustrating an example of a configuration of asemiconductor laser according to a third embodiment;

FIG. 19 is a drawing illustrating an example of a configuration of alight-emitting diode according to a fourth embodiment;

FIG. 20 is a drawing illustrating an example of a configuration of afield-effect transistor according to a fifth embodiment;

FIG. 21 is a drawing illustrating a thermoelectric transducer accordingto a sixth embodiment; and

FIG. 22 is another drawing illustrating the thermoelectric transduceraccording to the sixth embodiment.

DESCRIPTION OF EMBODIMENTS

Although “M. Lee et al., Journal of Applied Physics 59, 2895 (1986)”proposes improving the quality of a GaSb buffer layer as describedabove, it is not possible to form a high-quality T2SL crystal that fullysatisfies the desired characteristics of an infrared absorption layer byjust forming a GaSb buffer layer under various conditions. Accordingly,there is a demand for a semiconductor crystal substrate including a GaSbbuffer layer with a highly-flat surface.

Embodiments of the present invention are described below with referenceto the accompanying drawings. The same reference numbers are assigned tothe same components throughout the drawings, and repeated descriptionsof those components are omitted.

First Embodiment

The inventors studied the relationship between film-forming conditionsand flatness of a GaSb film. Specifically, as illustrated by FIG. 1,semiconductor crystal substrates were prepared by forming a GaSb layer12 a and a GaSb layer 12 b under different film-forming conditions on aGaSb substrate 11, and the flatness of surfaces of the GaSb layer 12 aand the GaSb layer 12 b was measured. The flatness of the surfaces ofthe GaSb layer 12 a and the GaSb layer 12 b was measured using an atomicforce microscope (AFM). Each of the GaSb layer 12 a and the GaSb layer12 b was formed by solid source molecular beam epitaxy (SSMBE) at aV/III ratio of about 10.

An oxide film formed on a surface of the GaSb substrate 11 was removedby heating the GaSb substrate 11 at a temperature of about 500° C. invacuum. FIG. 2 is an AFM image of the surface of the GaSb substrate 11after the oxide film is removed. As indicated by FIG. 2, when the oxidefilm is removed from the surface of the GaSb substrate 11 made of asemiconductor crystal, the surface of the GaSb substrate 11 becomesuneven. Measured surface roughness (RMS) of the surface of the GaSbsubstrate 11, from which the oxide film was removed, was 3.1 nm. Themeasurement range of surface roughness (RMS) was 1 μm×1 μm (which alsoapplies to the measurement of surface roughness of GaSb layers describedlater).

Next, the GaSb layer 12 a with a thickness of 500 nm was formed by MBEat a substrate temperature of 520° C. on the GaSb substrate 11 fromwhich the oxide film was removed. FIG. 3 is an AFM image of a surface ofthe GaSb layer 12 a formed under this condition. The surface roughness(RMS) of the GaSb layer 12 a was 0.13 nm. Thus, the surface of the GaSbsubstrate 11 or the semiconductor crystal substrate can be planarized byforming the GaSb layer 12 a.

Also, the GaSb layer 12 b with a thickness of 500 nm was formed by MBEat a substrate temperature of 440° C. on the GaSb substrate 11 fromwhich the oxide film was removed. FIG. 4 is an AFM image of a surface ofthe GaSb layer 12 b formed under this condition. The surface roughness(RMS) of the GaSb layer 12 b was 0.16 nm. Thus, although the GaSb layer12 b is not as flat as the GaSb layer 12 a formed at the substratetemperature of 520° C., the surface of the GaSb substrate 11 or thesemiconductor crystal substrate can also be planarized by forming theGaSb layer 12 b.

Here, as can be seen in FIG. 3, pits or dents are formed in the surfaceof the GaSb layer 12 a formed at the substrate temperature of 520° C.The pits are relatively deep, have a depth of several nm, and exist at adensity of about 10⁹ cm⁻². When an infrared absorption layer with a T2SLstructure is formed on the GaSb layer 12 a having pits in its surface,dislocations and defects tend to be formed in the infrared absorptionlayer due to the pits. This in turn may reduce the light sensitivity andincrease the dark current of an infrared detector.

On the other hand, as can be seen in FIG. 4, no pit is formed in thesurface of the GaSb layer 12 b formed at the substrate temperature of440° C. However, the surface roughness of the GaSb layer 12 b is greaterthan the surface roughness of the GaSb layer 12 a formed at thesubstrate temperature of 520° C.

Next, the conductivity of the GaSb layer 12 a and the GaSb layer 12 bformed at different substrate temperatures was examined. As a result ofthe examination, it was found out that the GaSb layer 12 a formed by MBEat the substrate temperature of 520° C. had p-type conductivity, and theGaSb layer 12 b formed by MBE at the substrate temperature of 440° C.had n-type conductivity. Also, the carrier concentrations in the GaSblayer 12 a formed at the substrate temperature of 520° C. and the GaSblayer 12 b formed at the substrate temperature of 440° C. were measuredby using a capacitance-voltage (CV) technique. The carrier concentrationin the GaSb layer 12 a was about 1×10¹⁸ cm⁻³, and the carrierconcentration in the GaSb layer 12 b was about 4×10¹⁸ cm⁻³. Further, theGaSb layer 12 a and the GaSb layer 12 b were analyzed by secondary ionmass spectrometry (SIMS), and it was found out that the concentration ofan impurity element (dopant) in each of the GaSb layer 12 a and the GaSblayer 12 b was less than or equal to 1×10¹⁷ cm⁻³.

The above results indicate that Sb is easily removed from a formed GaSblayer when the substrate temperature is high, and the amount of Ga isslightly greater than the amount of Sb in the GaSb layer 12 a formed byMBE at the substrate temperature of 520° C. Accordingly, it is assumedthat a part of Ga enters the site of Sb in the GaSb crystal and as aresult, the GaSb layer 12 a exhibits p-type conductivity. The aboveresults also indicate that the removal of Sb from a formed GaSb layer issuppressed when the substrate temperature is low, and the amount of Sbis slightly greater than the amount of Ga in the GaSb layer 12 b formedby MBE at the substrate temperature of 440° C. Accordingly, it isassumed that a part of Sb enters the site of Ga in the GaSb crystal andas a result, the GaSb layer 12 b exhibits n-type conductivity.

Here, when the substrate temperature during the formation of a GaSblayer is high, the movement of Ga atoms due to surface migration becomesactive. On the other hand, when the substrate temperature is low, themovement of Ga atoms due to surface migration becomes less active.Accordingly, it is assumed that the distance of movement of Ga atoms dueto surface migration becomes long in the GaSb layer 12 a formed at thesubstrate temperature of 520° C. and as a result, the surface of theGaSb layer 12 a becomes flatter than the surface of the GaSb layer 12 bformed at the substrate temperature of 440° C. Also, it is known thatwhen the composition ratio of Ga is high, Ga tends to form clusters.Accordingly, it can be considered that the pits in the surface of theGaSb layer 12 a formed at the substrate temperature of 520° C. areformed at the boundaries between the clusters.

Thus, the GaSb layer 12 a formed at the substrate temperature of 520° C.becomes rich in Ga, this Ga enters the site of Sb and functions as anacceptor, and as a result, the GaSb layer 12 a exhibits p-typeconductivity. The GaSb layer 12 a formed at a high substrate temperaturehas low surface roughness (RMS) and high flatness. However, pits tend tobe formed in the GaSb layer 12 a due to a high composition ratio of Ga.

On the other hand, the GaSb layer 12 b formed at the substratetemperature of 440° C. becomes rich in Sb, this Sb enters the site of Gaand functions as a donor, and as a result, the GaSb layer 12 b exhibitsn-type conductivity. Compared with the GaSb layer 12 a formed at thesubstrate temperature of 520° C., the GaSb layer 12 b formed at a lowersubstrate temperature has slightly higher surface roughness (RMS).However, no pit is formed in the GaSb layer 12 b because the compositionratio of Ga is low.

<Semiconductor Crystal Substrate>

A semiconductor crystal substrate according to a first embodiment isobtained based on the above findings. As illustrated by FIG. 5, thesemiconductor crystal substrate of the first embodiment includes a GaSbsubstrate 111 that is a crystal substrate, a p-type first GaSb layer 112formed on the GaSb substrate 111, and an n-type second GaSb layer 113formed on the first GaSb layer 112. More specifically, the first GaSblayer 112 is formed under the same condition as the GaSb layer 12 a,i.e., formed by MBE at a substrate temperature of 520° C. after an oxidefilm is removed from the surface of the GaSb substrate 111. Also, thesecond GaSb layer 113 is formed under the same condition as the GaSblayer 12 b, i.e., formed by MBE at a substrate temperature of 440° C.Here, the GaSb substrate 111 is substantially the same as the GaSbsubstrate 11.

FIG. 6 is an AFM image of a surface of the second GaSb layer 113 formedon the first GaSb layer 112 as described above. The first GaSb layer 112is formed at a substrate temperature of 520° C. and has a thickness of100 nm. The second GaSb layer 113 is formed at a substrate temperatureof 440° C. and has a thickness of 400 nm. As illustrated in FIG. 6, thesurface of the second GaSb layer 113 is flat with a surface roughness(RMS) of 0.10 nm, and no pit as in FIG. 3 is formed in the surface ofthe second GaSb layer 113.

Possible reasons why a film having a flat surface with not pit can beformed are explained below. First, because the first GaSb layer 112 isformed at a high substrate temperature of 520° C., the first GaSb layer112 becomes rich in Ga and although pits are formed, the first GaSblayer 112 becomes mostly flat. Second, because the second GaSb layer 113is formed on the first GaSb layer 112 at a low substrate temperature of440° C., the second GaSb layer 113 becomes rich in Sb and no pit isformed in the surface of the second GaSb layer 113. Also, it is assumedthat atoms moved due to surface migration fill the pits. These areassumed to be the reasons why the surface roughness (RMS) of the secondGaSb layer 113 becomes 0.10 nm that is less than the surface roughness(RMS) 0.13 nm of the GaSb layer 12 a formed at the surface temperatureof 520° C. and the surface roughness (RMS) 0.16 nm of the GaSb layer 12b formed at the surface temperature of 440° C. The concentration of animpurity element (dopant) in each of the GaSb layer 112 and the GaSblayer 113 is less than or equal to 1×10¹⁷ cm⁻³ and is substantially thesame as that in the GaSb layer 12 a and the GaSb layer 12 b. FIG. 7 is adrawing illustrating carrier concentrations in the GaSb layer 112 andthe GaSb layer 113 of the semiconductor crystal substrate of the presentembodiment. The carrier concentrations were measured by a CV techniquewhile etching the semiconductor crystal substrate in the depthdirection. As illustrated in FIG. 7, the first GaSb layer 112 has p-typeconductivity and has a carrier concentration of about 1×10¹⁸ cm⁻³, andthe second GaSb layer 113 has n-type conductivity and has a carrierconcentration of about 4×10¹⁸ cm⁻³.

FIG. 8 is an AFM image of a surface of a test sample including the GaSbsubstrate 111, a first GaSb film formed on the GaSb substrate 111 by MBEat a substrate temperature of 520° C. after removing an oxide film fromthe surface of the GaSb substrate 111, and a second GaSb film formed onthe first GaSb film by MBE at a substrate temperature of 470° C. Thesurface roughness (RMS) of the second GaSb film of the test sample is0.18 nm, carriers of the second GaSb film have p-type conductivity, andthe carrier concentration of the second GaSb film is about 5×10¹⁸ cm⁻³.Thus, the surface roughness (RMS) of this test sample is not low enough.

FIG. 9 is an AFM image of a surface of a test sample including the GaSbsubstrate 111, a first GaSb film formed on the GaSb substrate 111 by MBEat a substrate temperature of 520° C. after removing an oxide film fromthe surface of the GaSb substrate 111, and a second GaSb film formed onthe first GaSb film by MBE at a substrate temperature of 410° C. Thesurface roughness (RMS) of the second GaSb film of the test sample is0.13 nm, carriers of the second GaSb film have n-type conductivity, andthe carrier concentration of the second GaSb film is about 4×10¹⁸ cm⁻³.Thus, the surface roughness (RMS) of this test sample is also not lowenough.

In the present embodiment, the carrier concentration in each of thefirst GaSb layer 112 having p-type conductivity and the second GaSblayer 113 having n-type conductivity is preferably greater than or equalto 1×10¹⁸ cm⁻³ and less than or equal to 1×10²⁰ cm⁻³. The first GaSblayer 112 with such a carrier concentration can be formed by solidsource molecular beam epitaxy (SSMBE) at a substrate temperature greaterthan or equal to 500° C. and less than or equal to 550° C. Also, thesecond GaSb layer 113 with such a carrier concentration can be formed bysolid source molecular beam epitaxy (SSMBE) at a substrate temperaturegreater than or equal to 420° C. and less than or equal to 460° C.

As described above, the semiconductor crystal substrate of the presentembodiment includes the GaSb substrate 111 that is a crystal substrate,the first GaSb layer 112 formed on the GaSb substrate 111, and thesecond GaSb layer 113 formed on the first GaSb layer 112. The first GaSblayer 112 is rich in Ga and has p-type conductivity, and the second GaSblayer 113 is rich in Sb and has n-type conductivity. In the presentapplication, the first GaSb layer 112 may be referred to as a firstbuffer layer, and the second GaSb layer 113 may be referred to as asecond buffer layer.

Also in the present embodiment, each of the first buffer layer and thesecond buffer layer may be formed of Ga_(1-x)In_(x)As_(1-y)Sb_(y)(0≦x≦0.1, 0≦y<1). More specifically, each of the first buffer layer andthe second buffer layer may be formed of GaInSb, GaAsSb, or GaInAsSbthat is a material including In and/or As in addition to GaSb.

<Method for Producing Semiconductor Crystal Substrate>

Next, an exemplary method for producing a semiconductor crystalsubstrate according to the present embodiment is described withreference to FIGS. 10A through 10C. First, as illustrated by FIG. 10A,an n-type GaSb (001) substrate used as the GaSb substrate 111 is placedin a vacuum chamber of a solid source molecular beam epitaxy (SSMBE)apparatus. Next, the GaSb substrate 111 is heated by a heater. When thesubstrate temperature of the GaSb substrate 111 reaches 400° C., asurface of the GaSb substrate 111 is irradiated with an Sb beam. Thebeam flux of Sb is, for example, 5.0×10⁷ Torr. When the GaSb substrate111 is heated further, an oxide film of GaSb formed on the surface ofthe GaSb substrate 111 is removed at a substrate temperature of around500° C. Then, in a state where the Sb beam is being emitted, the GaSbsubstrate 111 is heated up to a substrate temperature of 530° C. and iskept in this state for 20 minutes to completely remove the oxide film ofGaSb formed on the surface of the GaSb substrate 111.

Next, as illustrated by FIG. 10B, the first GaSb layer 112 used as afirst buffer layer is formed on the GaSb substrate 111. Specifically, ina state where the GaSb substrate 111 is at the substrate temperature of520° C. and the Sb beam is being emitted, a Ga beam is also emitted toform the first GaSb layer 112. In this step, the beam flux of Ga is, forexample, 5.0×10⁻⁸ Torr, and the V/III ratio is 10. Under theseconditions, the growth rate of the first GaSb layer 112 is 0.30 μm/h.Film forming is performed for about 20 minutes until the thickness ofthe first GaSb layer 112 reaches 100 nm, and then the Ga beam isstopped. The first GaSb layer 112 formed at a substrate temperature of520° C. as described above has p-type conductivity.

Next, as illustrated by FIG. 10C, the second GaSb layer 113 used as asecond buffer layer is formed on the first GaSb layer 112 used as thefirst buffer layer. Specifically, in a state where the Sb beam is beingemitted, the substrate temperature is dropped to 440° C. and the Ga beamis emitted again to form the second GaSb layer 113. In this step, thebeam flux of Ga is, for example, 5.0×10⁻⁸ Torr, and the V/III ratio is10. Under these conditions, the growth rate of the second GaSb layer 113is 0.30 μm/h. Film forming is performed for about 80 minutes until thethickness of the second GaSb layer 113 reaches 400 nm, and then the Gabeam is stopped. The second GaSb layer 113 formed at a substratetemperature of 440° C. as described above has n-type conductivity.

Through the above process, the semiconductor crystal substrate of thepresent embodiment is produced. Although an n-type GaSb substrate isused as the GaSb substrate 111 in the present embodiment, a p-type GaSbsubstrate may also be used as the GaSb substrate 111. Also, the planedirection of the GaSb substrate 111 is not limited to (001), and an offsubstrate may also be used as the GaSb substrate 111. Further, an InAssubstrate may be used in place of the GaSb substrate 111.

Second Embodiment

Next, a second embodiment is described. In the second embodiment, aninfrared detector produced by using the semiconductor crystal substrateof the first embodiment is described. FIG. 11 illustrates an example ofa configuration of the infrared detector of the second embodiment, andFIG. 12 is an enlarged view of a part of the infrared detectorcorresponding to a pixel.

As illustrated by FIGS. 11 and 12, the infrared detector of the secondembodiment includes a GaSb substrate 111, a first GaSb layer 112 formedon the GaSb substrate 111, a second GaSb layer 113 formed on the firstGaSb layer 112, a p-type contact layer 114 formed on the second GaSblayer 113, an infrared absorption layer 115 formed on the p-type contactlayer 114, and an n-type contact layer 116 formed on the infraredabsorption layer 115. The GaSb substrate 111 is an n-type GaSb (001)substrate, the first GaSb layer 112 has a thickness of about 100 nm, andthe second GaSb layer 113 has a thickness of about 400 nm. The p-typecontact layer 114 is a p-type GaSb layer that has a thickness of 500 nmand is doped with Be as an impurity element. The infrared absorptionlayer 115 has an InAs/GaSb superlattice (T2SL) structure. Specifically,the infrared absorption layer 115 is formed by alternately stacking anInAs layer with a thickness of about 2 nm and a GaSb layer with athickness of about 2 nm. In the present embodiment, the infraredabsorption layer 115 includes 200 pairs of the InAs layer and the GaSblayer, and has a thickness of about 800 nm. The n-type contact layer 116is an n-type InAs layer that has a thickness of about 30 nm and is dopedwith Si as an impurity element. In the present application, the p-typecontact layer 114 may be referred to as a first contact layer, and then-type contact layer 116 may be referred to as a second contact layer.

Pixel separating grooves 120 are formed in the n-type contact layer 116and the infrared absorption layer 115 to separate pixels of the infrareddetector. A passivation film 131 composed of SiN is formed on the sidesurfaces and the bottom surfaces of the pixel separating grooves 120. Inthe infrared detector of the present embodiment, multiple pixelsseparated by the pixel separating grooves 120 are arrangedtwo-dimensionally. An electrode 141 is formed on the n-type contactlayer 116 of each of the pixels separated by the pixel separatinggrooves 120, and an electrode 142 is formed on the p-type contact layer114. The infrared absorption layer 115 and the n-type contact layer 116near the electrode 142 form a wiring support 143. Also, a wiring layer144 is formed to extend from the electrode 142, via the side surface ofthe wiring support 143, to the upper surface of the wiring support 143.Accordingly, the infrared absorption layer 115 and the n-type contactlayer 116 forming the wiring support 143 are not used for infrareddetection. Each of the electrodes 141 and 142 is formed of a metalmultilayer film of Ti, Pt, and Au. In the present embodiment, astructure or a device with the above configuration may be referred to asan infrared detector or an infrared detecting device 150. The infrareddetector of the present embodiment can detect infrared radiation thatenters from the back side of the GaSb substrate 111.

As illustrated by FIG. 11, the infrared detector of the presentembodiment has a configuration where a signal reading circuit device 160is connected to the infrared detecting device 150. For this connection,bumps 145 are formed on the electrodes 141 of the infrared detectingdevice 150, and a bump 146 is formed on the wiring layer 144 of theinfrared detecting device 150. The signal reading circuit device 160includes a circuit board 161 on which a signal reading circuit(s) isformed. Electrodes 162 are formed on the circuit board 161, and bumps163 are formed on the electrodes 162. The bumps 145 and 146 and thebumps 163 are formed to face each other. The infrared detecting device150 and the signal reading circuit device 160 are connected to eachother by connecting the bumps 145 and 146 with the corresponding bumps163. FIG. 13 is a perspective view of the infrared detector of thepresent embodiment.

<Method for Producing Infrared Detector>

Next, an exemplary method for producing an infrared detector accordingto the second embodiment is described with reference to FIGS. 14Athrough 17B. The infrared detector of the second embodiment can beproduced by using the semiconductor crystal substrate of the firstembodiment. Each of FIGS. 14A, 15A, 16A, and 17A illustrates the wholeof a structure relevant to the corresponding step, and each of FIGS.14B, 15B, 16B, and 17B is an enlarged view of a part of the structurecorresponding to a pixel.

First, as illustrated by FIGS. 14A and 14B, the first GaSb layer 112,the second GaSb layer 113, the p-type contact layer 114, the infraredabsorption layer 115, and the n-type contact layer 116 are epitaxiallygrown in this order on the GaSb substrate 111 by MBE. A structureobtained by sequentially forming the first GaSb layer 112 and the secondGaSb layer 113 on the GaSb substrate 111 corresponds to thesemiconductor crystal substrate of the first embodiment. Therefore,detailed descriptions of the GaSb substrate 111, the first GaSb layer112, and the second GaSb layer 113 are omitted here.

Specifically, the first GaSb layer 112 and the second GaSb layer 113 aresequentially formed on the GaSb substrate 111, and the p-type contactlayer 114 is formed on the second GaSb layer 113. The p-type contactlayer 114 is a p-type GaSb layer that is formed by emitting Ga, Sb, andBe beams. In this step, the temperature of the Be cell is adjusted sothat the concentration of Be that is an impurity element used as adopant of the p-type contact layer 114 becomes 5.0×10¹⁸ cm⁻³. Also inthis step, the beam flux of Ga is 5.0×10⁻⁸ Torr, the beam flux of Sb is5.0×10⁻⁷ Torr, and the V/III ratio is 10. Under these conditions, thegrowth rate of GaSb is 0.30 μm/h. Film forming is performed for about100 minutes until the thickness of the p-type contact layer 114 reaches500 nm, and then the Be and Ga beams are stopped.

Next, the infrared absorption layer 115 with an InAs/GaSb superlatticestructure is formed on the p-type contact layer 114. Specifically, theSb beam is stopped, and In and As beams are emitted. In this step, thebeam flux of In is 5.0×10⁻⁸ Torr, the beam flux of As is 5.0×10⁻⁷ Torr,and the V/III ratio is 10. Under these conditions, the growth rate ofInAs is 0.30 μm/h. Film forming is performed for about 36 seconds untilthe thickness of an InAs layer reaches 2 nm, and then the In and Asbeams are stopped. Next, after an interval of three seconds, Ga and Sbbeams are emitted. In this step, the beam flux of Ga is 5.0×10⁻⁸ Torr,the beam flux of Sb is 5.0×10⁻⁷ Torr, and the V/III ratio is 10. Underthese conditions, the growth rate of GaSb is 0.30 μm/h. Film forming isperformed for about 36 seconds until the thickness of a GaSb layerreaches 2 nm, and then the Ga and Sb beams are stopped. After aninterval of three seconds, the above steps are repeated. In thisexample, when the formation of an InAs layer and the formation of a GaSblayer constitute one cycle, the cycle is repeated 200 times to form theinfrared absorption layer 115 with a total thickness of about 800 nm.

Next, the n-type contact layer 116 is formed on the infrared absorptionlayer 115. The n-type contact layer 116 is an n-type InAs layer that isformed by emitting In, As, and Si beams. In this step, the temperatureof the Si cell is adjusted so that the concentration of Si that is animpurity element used as a dopant of the n-type contact layer 116becomes 5.0×10¹⁸ cm⁻³. Also in this step, the beam flux of In is5.0×10⁻⁸ Torr, the beam flux of As is 5.0×10⁷ Torr, and the V/III ratiois 10. Under these conditions, the growth rate of InAs is 0.30 μm/h.Film forming is performed for about 6 minutes until the thickness of anInAs layer reaches 30 nm, and then the In and Si beams are stopped.

Next, in a state where the As beam is being emitted, the substratetemperature is dropped to 400° C. Then, the As beam is stopped, and astructure where epitaxial films are formed on the GaSb substrate 111 istaken out of the vacuum chamber of the MBE apparatus.

Next, as illustrated by FIGS. 15A and 15B, portions of the n-typecontact layer 116 and the infrared absorption layer 115 are removed toform the pixel separating grooves 120. Specifically, a photoresist isapplied to the n-type contact layer 116, and the photoresist is exposedand developed by an exposure apparatus to form a resist pattern (notshown) having openings in areas where the pixel separating grooves 120are to be formed. Then, portions of the n-type contact layer 116 and theinfrared absorption layer 115 in the areas not covered by the resistpattern are removed by dry etching using a CF₄ gas to form the pixelseparating grooves 120. As a result, pixels having a mesa structure andseparated by the pixel separating grooves 120 are formed. In the presentembodiment, the size of each pixel is 50 μm×50 μm, and 256×256 pixelsare formed in the infrared detector.

Next, as illustrated by FIGS. 16A and 16B, the passivation film 131 isformed on the upper surface of the n-type contact layer 116 and the sidesurfaces of the n-type contact layer 116 and the infrared absorptionlayer 115 forming each pixel, and on the upper surface of the p-typecontact layer 114 between pixels. The passivation film 131 is an SiNfilm with a thickness of 100 nm and is formed by plasma chemical vapordeposition (CVD) using SiH₄ and NH₃ gases.

Next, a photoresist is applied to the structure of FIG. 16A, and thephotoresist is exposed and developed by an exposure apparatus to form aresist pattern (not shown) having openings in areas where the electrodes141 and 142 are to be formed. Then, portions of the passivation film 131in the areas not covered by the resist pattern are removed by dryetching using a CF₄ gas to expose portions of the n-type contact layer116 and the p-type contact layer 114 in those areas.

Next, as illustrated by FIGS. 17A and 17B, the electrodes 141 are formedon the exposed portions of the n-type contact layer 116 and theelectrode 142 is formed on the exposed portion of the p-type contactlayer 114. Specifically, a resist pattern (not shown) is formed to haveopenings in areas where the electrodes 141 and 142 are to be formed.Next, a metal multilayer film made of Ti, Pt, and Au is formed by vacuumdeposition or sputtering, and the metal multilayer film is immersed in,for example, an organic solvent to remove, together with the resistpattern, portions of the metal multilayer film on the resist pattern bya lift-off technique. The remaining portions of the metal multilayerfilm form the electrodes 141 on the n-type contact layer 116 and theelectrode 142 on the p-type contact layer 114.

Next, as illustrated in FIG. 11, the wiring layer 144 is formed on theelectrode 142 and the side and upper surfaces of the wiring support 143,the bumps 145 are formed on the electrodes 141, and the bump 146 isformed on a portion of the wiring layer 144 above the wiring support143. The formed bumps 145 and 146 are connected with the bumps 163 ofthe signal reading circuit device 160 by flip-chip bonding. As a result,the infrared detecting device 150 and the signal reading circuit device160 are connected to each other.

Configurations of the infrared detector not described above aresubstantially the same as those in the first embodiment.

Third Embodiment

Next, a third embodiment is described. In the third embodiment, a GaSbsemiconductor laser produced by using the semiconductor crystalsubstrate of the first embodiment is described. FIG. 18 illustrates anexemplary configuration of the semiconductor laser of the thirdembodiment.

The semiconductor laser of the third embodiment includes thesemiconductor crystal substrate of the first embodiment where the firstGaSb layer 112 and the second GaSb layer 113 are sequentially formed onthe GaSb substrate 111. The semiconductor laser also includes a p-typeGaSb cladding layer 221, a multi-quantum well (MQW) layer 222, an n-typeGaSb cladding layer 223, and an n-type InAs layer 224 that are formed onthe second GaSb layer 113 in this order. The p-type GaSb cladding layer221 has a thickness of about 500 nm and is doped with Be as a p-typeimpurity element. The MQW layer 222 is formed by alternately stacking aGaSb layer with a thickness of about 5 nm and an InAs layer with athickness of about 5 nm. In the present embodiment, the MQW layer 222includes 20 pairs of the GaSb layer and the InAs layer. The n-type GaSbcladding layer 223 has a thickness of about 100 nm, is doped with Si asan n-type impurity element, and has a carrier concentration of 5.0×10¹⁸cm⁻³. The n-type InAs layer 224 has a thickness of about 30 nm.

Next, portions of the n-type InAs layer 224, the n-type GaSb claddinglayer 223, and the MQW layer 222 are removed to form a mesa structure230. Specifically, portions of the n-type InAs layer 224, the n-typeGaSb cladding layer 223, and the MQW layer 222 are removed by dryetching using a CF₄ gas as an etching gas to expose portions of thep-type GaSb cladding layer 221 and thereby form the mesa structure 230.

Next, lower electrodes 241 are formed on the exposed portions of thep-type GaSb cladding layer 221, and an upper electrode 242 is formed onthe upper surface of the n-type InAs layer 224. Each of the lowerelectrodes 241 and the upper electrode 242 is formed of, for example, ametal multilayer film of Ti, Pt, and Au.

Then, the GaSb substrate 111 is cleaved to form a stripe-shaped piecehaving a width of 20 μm and a length of 50 μm. As a result, thesemiconductor laser of the present embodiment is produced. Thesemiconductor laser is an edge emitting laser with a wavelength of 3.0μm.

Fourth Embodiment

Next, a fourth embodiment is described. In the fourth embodiment, a GaSblight emitting diode (LED) produced by using the semiconductor crystalsubstrate of the first embodiment is described. FIG. 19 illustrates anexemplary configuration of the light emitting diode of the fourthembodiment.

The light emitting diode of the fourth embodiment includes thesemiconductor crystal substrate of the first embodiment. Similarly tothe third embodiment, after the p-type GaSb cladding layer 221, the MQWlayer 222, the n-type GaSb cladding layer 223, and the n-type InAs layer224 are epitaxially grown on the second GaSb layer 113 by MBE, the lowerelectrode 241 and the upper electrode 242 are formed.

Then, the GaSb substrate 111 is cleaved to form a chip having a width of50 μm and a length of 50 μm. As a result, the light emitting diode ofthe fourth embodiment is produced. The light emitting diode emits lightfrom the side on which the n-type InAs layer 224 is formed. Accordingly,the area of the n-type InAs layer 224 where the upper electrode 242 isnot present is preferably as large as possible.

Fifth Embodiment

Next, a fifth embodiment is described. In the fifth embodiment, a fieldeffect transistor (FET) produced by using the semiconductor crystalsubstrate of the first embodiment is described. FIG. 20 illustrates anexemplary configuration of the field effect transistor of the fifthembodiment.

The field effect transistor of the fifth embodiment includes thesemiconductor crystal substrate of the first embodiment where the firstGaSb layer 112 and the second GaSb layer 113 are sequentially formed onthe GaSb substrate 111. An Al_(0.8)Ga_(0.2)Sb layer 251 and a channellayer 252 are sequentially formed by MBE on the second GaSb layer 113.The thickness of the Al_(0.8)Ga_(0.2)Sb layer 251 is about 2 nm. Thechannel layer 252 is a p-type In_(0.2)Ga_(0.8)Sb layer with a thicknessof 5 nm, is doped with Be as a p-type impurity element, and has acarrier concentration of 5.0×10¹⁸ cm⁻³.

Next, an insulating film 260 is formed by atomic layer deposition (ALD)on the channel layer 252. The insulating film 260 is an Al₂O₃ film witha thickness of 3 nm.

Next, a gate electrode 271 is formed on the insulating film 260, and asource electrode 272 and a drain electrode 273 are formed on the channellayer 252. The gate electrode 271 may be a tungsten (W) film with athickness of about 100 nm, and may be formed by CVD on the insulatinglayer 260. The gate electrode 271 is formed to have a gate length of 30nm. Next, portions of the insulating film 260, which correspond to areaswhere the source electrode 272 and the drain electrode 273 are to beformed, are removed. Then, the source electrode 272 and the drainelectrode 273 are formed in the areas with, for example, Ni films.

Through the above process, the field effect transistor of the fifthembodiment is produced.

Sixth Embodiment

Next, a sixth embodiment is described. In the sixth embodiment, athermoelectric transducer produced by using the semiconductor crystalsubstrate of the first embodiment is described. The thermoelectrictransducer of the sixth embodiment is described below with reference toFIGS. 21 and 22.

The thermoelectric transducer of the sixth embodiment includes thesemiconductor crystal substrate of the first embodiment where the firstGaSb layer 112 and the second GaSb layer 113 are sequentially formed onthe GaSb substrate 111. A superlattice layer 280 and a cap layer 281 aresequentially formed by MBE on the second GaSb layer 113. Thesuperlattice layer 280 is formed by alternately stacking a GaSb layerwith a thickness of about 5 nm and an InAs layer with a thickness ofabout 5 nm. In the present embodiment, the superlattice layer 280includes 500 pairs of the GaSb layer and the InAs layer. The cap layer281 is a non-doped InAs film with a thickness of 30 nm.

Next, portions of the cap layer 281, the superlattice layer 280, thesecond GaSb layer 113, and the first GaSb layer 112 are removed to formmesa structures 282. Specifically, portions of the cap layer 281, thesuperlattice layer 280, the second GaSb layer 113, and the first GaSblayer 112 are removed by dry etching using a CF₄ gas as an etching gasto form the mesa structures 282. FIG. 21 illustrates a resultingstructure.

Next, an SiO₂ film 283 is formed to fill a gap between the mesastructures 282. Next, the back side of the GaSb substrate 111 is groundby chemical mechanical polishing (CMP) to reduce the thickness of theGaSb substrate 111 to about 3 μm. Next, n-type and p-type dopants areion-implanted into the mesa structures 282 and activation annealing isperformed to form n-type regions (n-type elements) and p-type regions(p-type elements). Then, electrodes 290 are formed on the ends of then-type elements and the p-type elements such that the n-type elementsand the p-type elements are connected in series. Each of the electrodes290 is formed of, for example, a metal multilayer film of Ti, Pt, andAu.

An aspect of this disclosure makes it possible to provide asemiconductor crystal substrate including a GaSb layer with ahighly-flat surface.

All examples and conditional language provided herein are intended forthe pedagogical purposes of aiding the reader in understanding theinvention and the concepts contributed by the inventors to further theart, and are not to be construed as limitations to such specificallyrecited examples and conditions, nor does the organization of suchexamples in the specification relate to a showing of the superiority andinferiority of the invention. Although one or more embodiments of thepresent invention have been described in detail, it should be understoodthat the various changes, substitutions, and alterations could be madehereto without departing from the spirit and scope of the invention.

What is claimed is:
 1. A semiconductor crystal substrate, comprising: acrystal substrate that is formed of a material including one of GaSb andInAs; a first buffer layer that is formed on the crystal substrate andformed of a material including GaSb, the first buffer layer having ap-type conductivity; and a second buffer layer that is formed on thefirst buffer layer and formed of a material including GaSb, the secondbuffer layer having an n-type conductivity.
 2. The semiconductor crystalsubstrate as claimed in claim 1, wherein a concentration of a dopant inthe first buffer layer is less than or equal to 1.0×10¹⁷ cm⁻³; a carrierconcentration in the first buffer layer is greater than or equal to1×10¹⁸ cm⁻³ and less than or equal to 1×10²⁰ cm⁻³; a concentration of adopant in the second buffer layer is less than or equal to 1.0×10¹⁷cm⁻³; and a carrier concentration in the second buffer layer is greaterthan or equal to 1×10¹⁸ cm⁻³ and less than or equal to 1×10²⁰ cm⁻³. 3.The semiconductor crystal substrate as claimed in claim 1, wherein thefirst buffer layer is formed of the material including GaSb and one orboth of In and As; and the second buffer layer is formed of the materialincluding GaSb and one or both of In and As.
 4. An infrared detector,comprising: a crystal substrate that is formed of a material includingone of GaSb and InAs; a first buffer layer that is formed on the crystalsubstrate and formed of a material including GaSb, the first bufferlayer having a p-type conductivity; a second buffer layer that is formedon the first buffer layer and formed of a material including GaSb, thesecond buffer layer having an n-type conductivity; a first contact layerthat is formed on the second buffer layer and has a first conductivitytype; an infrared absorption layer that is formed on the first contactlayer and has a superlattice structure; and a second contact layer thatis formed on the infrared absorption layer and has a second conductivitytype.
 5. The infrared detector as claimed in claim 4, wherein aconcentration of a dopant in the first buffer layer is less than orequal to 1.0×10¹⁷ cm⁻³; a carrier concentration in the first bufferlayer is greater than or equal to 1×10¹⁸ cm⁻³ and less than or equal to1×10²⁰ cm⁻³; a concentration of a dopant in the second buffer layer isless than or equal to 1.0×10¹⁷ cm⁻³; and a carrier concentration in thesecond buffer layer is greater than or equal to 1×10¹⁸ cm⁻³ and lessthan or equal to 1×10²⁰ cm⁻³.
 6. The infrared detector as claimed inclaim 4, wherein the first buffer layer is formed of the materialincluding GaSb and one or both of In and As; and the second buffer layeris formed of the material including GaSb and one or both of In and As.7. The infrared detector as claimed in claim 4, wherein the firstconductivity type of the first contact layer is a p-type, and the firstcontact layer is formed of a material including GaSb; the infraredabsorption layer has the superlattice structure that is formed byalternately stacking a GaSb layer and an InAs layer; and the secondconductivity type of the second contact layer is an n-type, and thesecond contact layer is formed of a material including InAs.
 8. Theinfrared detector as claimed in claim 4, wherein pixel separatinggrooves are formed in the second contact layer and the infraredabsorption layer to separate pixels of the infrared detector.
 9. Amethod of producing a semiconductor crystal substrate, the methodcomprising: forming a first buffer layer on a crystal substrate bymolecular beam epitaxy with a material including GaSb, the crystalsubstrate being formed of a material including one of GaSb and InAs; andforming a second buffer layer on the first buffer layer by the molecularbeam epitaxy with a material including GaSb, wherein the first bufferlayer is formed at a substrate temperature greater than or equal to 470°C. and less than or equal to 550° C.; and the second buffer layer isformed at a substrate temperature greater than or equal to 420° C. andless than or equal to 460° C.
 10. The method as claimed in claim 9,wherein the first buffer layer is formed at a substrate temperaturegreater than or equal to 500° C. and less than or equal to 550° C. 11.The method as claimed in claim 9, wherein the molecular beam epitaxy issolid source molecular beam epitaxy.
 12. The method as claimed in claim9, wherein the first buffer layer is formed of the material includingGaSb and one or both of In and As; and the second buffer layer is formedof the material including GaSb and one or both of In and As.
 13. Amethod of producing an infrared detector, the method comprising: forminga first contact layer having a first conductivity type on the secondbuffer layer of the semiconductor crystal substrate produced by themethod of claim 9; forming an infrared absorption layer having asuperlattice structure on the first contact layer; and forming a secondcontact layer having a second conductivity type on the infraredabsorption layer.
 14. The method as claimed in claim 13, wherein thefirst conductivity type of the first contact layer is a p-type, and thefirst contact layer is formed of a material including GaSb; the infraredabsorption layer has the superlattice structure that is formed byalternately stacking a GaSb layer and an InAs layer; and the secondconductivity type of the second contact layer is an n-type, and thesecond contact layer is formed of a material including InAs.